| ExampleData {rsurface} | R Documentation |
Example data for the rsurface package
Description
This example uses experimental data published in Czitrom and Spagon (1997), Statistical Case Studies for Industrial Process Improvement that describes a semiconductor wafer processing experiment. A goal of this experiment was to fit response surface models to the deposition layer stress as a function of two particular controllable factors of the chemical vapor deposition (CVD) reactor process. These factors were pressure (measured in torr) and the ratio of the gaseous reactants hydrogen gas and tungsten(VI) fluoride.
Usage
ExampleData
Format
A data frame with three columns and ten rows of values
- Factor1
Pressure measured in torr
- Factor2
The ratio of gaseous reactants. The smallest and greatest values for the ratios of hydrogen gas to tungsten(VI) fluoride were chosen to be 2 and 10.
- Response
Deposition layer stress
References
Czitrom, V., and Spagon, P. D., (1997), Statistical Case Studies for Industrial Process Improvement, Philadelphia, PA, ASA-SIAM Series on Statistics and Applied Probability.