Plasma {lmPerm} | R Documentation |
Plasma Etching
Description
An experiment designed to guide optimization of a nitride etch process
Usage
data(Plasma)
Details
An orthogonal arry, capable of supporting a linear model only. The factors are denoted by their units of measurement. They were W, the power applied to the cathode; mTorr, the pressure in the reaction chamber; cm, gap between anode and cathode; sscm, flow if the reactant gas. The three responses: Amin, etch rate; Pct, unifomity; sinpoly, selectivity.
Author(s)
Bob Wheeler bwheelerg@gmail.com
References
Vardeman, Stephen B. (1994).Statistics for engineering problem solving. PWS publishing Co. Boston. p 596
[Package lmPerm version 2.1.0 Index]